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Title

Growth and optical characterization of indium oxide (InOX) AND Zinc oxide (ZnO) Films

Alternative Title

Ανάπτυξη και οπτικός χαρακτηρισμός λεπτών υμενίων InOX και ZnO

Author

Πανάγου, Σωτήριος Β.

Thesis advisor

Κυριακίδης, Γεώργιος

Abstract

Indium Oxide and Zinc Oxide thin films have been prepared by reactive dc magnetron sputtering in oxygen plasma, using metallic In or Zn targets respectively. Films were deposited onto Corning 1707F low alkali glass substrates. Transmission spectrum has been obtained by UV/Vis spectroscopy, in order to determine the optical constants in a variety of thickness (600 – 1600 nm) and optical band gaps. For Indium oxide, refractive index had an average value of 1.99, the energy band gap was found to be 3.5±0.05 eV and its lattice permittivity in the region of 3.6 – 4.3. For Zinc Oxide, refractive index had an average value of 1.89, the energy band gap was found to be 3.21±0.05 eV and its lattice permittivity in the region of 3.3 – 3.8. Spectroscopic Ellipsometry measurements have been made on ZnO thin films with a variety of thicknesses (200 nm, 250nm), in order to create a model for the fitting of the measured values and evaluate the optical constants, thickness and their complex dielectric function.

Language

English

Subject

Ellipsometric

Fasmatoscopy

Oxide

Sputtering

Ελλειψόμετρο

Εναπόθεση

Οξείδιο

Φασματόμετρο

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