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Identifier

000353042

Title

Study of In2O3 and ZnO thin films for selective gas sensors applications : Growth effect on the films structure and surface topology as essential factor in metal oxide thin films sensing applications

Alternative Title

Μελέτη λεπτών υμενίων Ιn2O3 και ZnO για εφαρμογές σε επιλεκτικούς αισθητήρες αερίων: Η επίδραση της ανάπτυξης στην δομή των υμενίων και της επιφανειακής τους τοπολογίας ως ουσιαστικός παράγοντας για εφαρμογές αισθητήρων από λεπτά υμένια οξειδίων μετάλλων

Author

Suchea, Mirela Petruta

Thesis advisor

Κιτσόπουλος, Θεοφάνης

Abstract

The goal of this thesis was the study of In₂O₃ and ZnO thin films for selective gas sensors applications with focus on the growth effect on the films structure and surface topology, essential factors in metal oxide thin film sensors operation. One of the main problems in the field of metal oxide thin film sensors is the impossibility to elaborate a unitary methodology for reproducing the sensor response in correlation with the surface characteristics. For this reason, the systematic study of the influence of the surface characteristics on the sensing involved phenomena plays a major role for the development of optimized gas sensors. Using DC magnetron sputtering and pulsed laser deposition, nanostructured In₂O₃ and pure or doped ZnO thin films were grown and fully characterized. The study was focused on the morphology of the film and how this can affect their photoreduction with UV light and oxidation by oxidizing gas (ozone), so that the film properties can be optimized for gas sensing applications. For this purpose, different series of samples were grown like: - In₂O₃ series by DC magnetron sputtering varying the following growth parameters: thickness, growth temperature and total pressure and oxygen:argon ratio during the deposition. - Pure ZnO series by DC magnetron sputtering from metallic and ceramic targets varying the following growth parameters: thickness for different constant growth temperatures, temperature for constant thickness, total pressure and oxygen:argon ratio during the deposition. - 2% Al doped ZnO by DC magnetron sputtering varying the following growth parameters: thickness and oxygen:argon ratio during growth. - In doped ZnO thin films by DC magnetron sputtering varying the following growth parameters: thickness and oxygen:argon ratio during growth. - Pure ZnO series by PLD varying the following growth parameters: thickness and substrate temperature with focus on very thin films (40nm and 100nm series at different growth temperatures). All films were fully characterized with respect to their structural and surface topology (for understating and optimization of the influences of the growth conditions on the surface properties), optical/electrical response (for understanding and optimization of the photoreduction and oxidation processes) and sensing behavior. Detailed surface characterization of each film surface was performed and the results were used for further correlation between surface properties and sensing response. Graphical correlations between surface parameters and sensor response parameters were done for each material studied.

Language

English

Subject

Atomic force microscopy

Indium oxide

Metal oxides thin films

Sensing applications

Surface characterization

UV photoreduction-ozone oxidation

Zinc oxide

Εφαρμογές αισθητήρων

Λεπτά υμένια οξειδίων μετάλλων